FOM Name: ETCH XeF2 Etcher
Make/Model: SPTS Xactix E1
Contact: Kurt Kupcho (kakupcho@wisc.edu, 608-262-2982)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The XeF2 etcher is a system designed to expose samples to xenon difluoride (XeF2) gas, using vacuum, in a cyclic mode. The system is computer software controlled where users can run pre-defined recipes based on # of etch cycles, etch time per cycle, XeF2 pressure, and N2 pressure. The system has automatic safety features of purging and locking fume hood in place.
This instrument has material restrictions. Consult the allowed materials list for this instrument in FOM.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
- 35C heated expansion and etch chambers allows for XeF2 pressures of up to 5.5T
- Dry pump
- Fume hood
- Computer controlled via software
Limitations
- 4” diameter wafers or smaller
- Isotropic etch
- Sample must be completely dry
