Yes Plasma Asher

FOM Name:  ETCH Plasma Asher
Make/Model:  YES R3
Contact:  Kurt Kupcho (kakupcho@wisc.edu, 608-262-2982)
Center:  NFC
Location:  Engineering Centers Building 3rd Floor Cleanroom

The system has a RF power supply, O2 supply, gas flow and pressure control to produce an O2 plasma.  The system is limited to certain gas flows, pressures, and RF power to produce a stable O2 plasma because there is no matching network on the tool.  This tool is great for quick O2 plasmas needed to clean or oxidize surfaces.

This instrument has material restrictions.  Consult the allowed materials list for this instrument in FOM.

This is an accordion element with a series of buttons that open and close related content panels.

Configuration

  • O2 gas
  • Mechanical pump

Limitations

  • 400W
  • No matching network