FOM Name: FURN MRL Tube 2 High Temp Oxidation
Make/Model: MRL Cyclone
Contact: Kurt Kupcho (kakupcho@wisc.edu, 608-262-2982)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The oxidation system located in Tube 2 of the MRL furnaces can process small pieces, 3, 4 and 6-inch wafers. The system uses a microprocessor sequencer to automatically control the in and out movement of the cantilever, the tube temperature and gas flow. Wafers are loaded on quartz boats and transferred into the tube at a slow controlled pace. Users can run recipes for dry oxidations, wet oxidations or anneals. Recipe temperatures range from 750°C to 1050°C. A pre-furnace clean of all samples going into this furnace is required.
This instrument has material restrictions. Consult the allowed materials list for this instrument in FOM.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
- Nitrogen backfill option for just annealing
- Wet oxidation via steam
- Dry oxidation via O2 gas
- Automatic recipe operation
- Dedicated quartzware
Limitations
- Pre-furnace clean required before use
- Minimum temperature 750C
- Maximum temperature 1050C
