FOM Name: FURN MRL Tube 3 Low Temp Oxidation
Make/Model: MRL Cyclone
Contact: Kurt Kupcho (kakupcho@wisc.edu, 608-262-2982)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The low temp oxidation system is located in Tube 3 of the MRL furnaces and can process small pieces, 3, 4 and 6-inch wafers. The system uses a microprocessor sequencer to automatically control the in and out movement of the cantilever, tube temperature and gas flow. Wafers are loaded on quartz boats and transferred into the tube at a slow controlled pace. Users can run recipes for dry oxidations, wet oxidations or anneals. Recipe temperatures range from 380°C to 700°C.
This instrument has material restrictions. Consult the allowed materials list for this instrument in FOM.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
- Nitrogen backfill option for just annealing
- Wet oxidation via steam
- Dry oxidation via O2 gas
- Automatic recipe operation
- Dedicated quartzware
Limitations
- Minimum temperature 380C
- Maximum temperature 700C
