FOM Name: FURN MRL Tube 4 Low Temp Anneal
Make/Model: MRL Cyclone
Contact: Kurt Kupcho (kakupcho@wisc.edu, 608-262-2982)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The anneal system located in Tube 4 of the MRL furnaces can process small pieces, 3, 4 and 6-inch wafers. The system uses a microprocessor sequencer to automatically control the in and out movement of the cantilever, the tube temperature and gas flow. Wafers are loaded on quartz boats and transferred into the tube at a slow controlled pace. Users can run recipes for their desired temperature and backfill gases. Recipe temperatures range from 380°C to 700°C.
This instrument has material restrictions. Consult the allowed materials list for this instrument in FOM.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
- Nitrogen or forming gas backfill
- Automatic recipe operation
- Dedicated quartzware
Limitations
- Minimum temperature 380C
- Maximum temperature 700C
