FOM Name: LITH Solvent / Develop Bench
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Contact: Quinn Leonard (qleonard@wisc.edu, 608-890-3030)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The 1165 chemical bench has two temperature-controlled tanks and one sink. The heated tanks contain Rohm-Haas 1165 Remover and are dedicated to removing photoresist. One tank is for wafers and the other is for lithography masks. There are low-level sensors in each tank that when activated prevent heating of the solvent. The tank temperatures are controlled via a closed-loop control system with redundant over-temperature safety interlocks. The bench is also equipped with two solvent carboys with full-level sensors. The two tanks and the bench deck basin drain into the carboys.
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