Solvent / Develop Bench for Photoresist

FOM Name:  LITH Solvent / Develop Bench
Contact: Quinn Leonard (, 608-890-3030)
Center:  NFC
Location: Engineering Centers Building 3rd Floor Cleanroom

The 1165 chemical bench has two temperature-controlled tanks and one sink.  The heated tanks contain Rohm-Haas 1165 Remover and are dedicated to removing photoresist.  One tank is for wafers and the other is for lithography masks.  There are low-level sensors in each tank that when activated prevent heating of the solvent.  The tank temperatures are controlled via a closed-loop control system with redundant over-temperature safety interlocks.  The bench is also equipped with two solvent carboys with full-level sensors.  The two tanks and the bench deck basin drain into the carboys.

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