FOM Name: WET Al Etch Bench
Model:
Contact: Quinn Leonard (qleonard@wisc.edu, 608-890-3030)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The aluminum etch chemical bench has one process tank containing a commercially prepared Defreckling Aluminum Etch acid. The bench is equipped with two wafer holders and one holder for wafer pieces, one quick dump rinse tank (QDR), a hotplate well and sink. The tank has a Teflon immersion heater and Teflon fiber optic liquid level sensor. The system controller has temperature settings for both high and low levels. The level sensor monitors the solution level in the tank and will alarm when a low liquid level is detected. The tank temperature is set at 40ºC.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
Limitations
Contact: Quinn Leonard (qleonard@wisc.edu, 608-890-3030)
Instrument Center: NFC
Instrument Location: Engineering Centers Building 3rd Floor Cleanroom
Process Description:
Etching is a process of removing material from the surface of a wafer. Various methods of etching include: wet chemical, electrochemical, plasma etching, reactive ion etching, ion beam milling, sputtering and vapor etching. Wet etching is a completely chemical process in which the etchant solution can be highly selective to the material of interest. The reactive species in the solution creates a soluble byproduct that moves away from the exposed surface of the wafer. The etch process is controlled by time, bath temperature and solution composition.
Equipment Description:
The aluminum etch chemical bench has one process tank containing a commercially prepared Defreckling Aluminum Etch acid. The bench is equipped with two wafer holders and one holder for wafer pieces, one quick dump rinse tank (QDR), a hotplate well and sink. The tank has a Teflon immersion heater and Teflon fiber optic liquid level sensor. The system controller has temperature settings for both high and low levels. The level sensor monitors the solution level in the tank and will alarm when a low liquid level is detected. The tank temperature is set at 40ºC.
Approved Materials for use in this equipment:
Check the APPROVED MATERIALS for this equipment on http://mywebscape.wisc.edu under WCAM in the group directories.
Date last modified: 1/16/2017
Date created: 9/24/2008
Content by: Rebecca Bauer