FOM Name: WET Nitride Etch Bench
Model:
Contact: Quinn Leonard (qleonard@wisc.edu, 608-890-3030)
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The nitride strip chemical bench has one process tank containing a phosphoric acid solution and one quick dump rinse tank (QDR). The bench is equipped with two wafer holders and one holder for wafer pieces. The process tank bath consists of a Fluoropolymer tank, an immersion heater, and a condensing head with coils. When the system achieves 170ºC the condensing coils and a make-up DI drip are activated to maintain the proper water concentration in the phosphoric acid. A level sensor monitors the solution level in the tank and will alarm when a low liquid level is detected.
