FOM Name: WET Piranha Bench
Model:
Contact:
Center: NFC
Location: Engineering Centers Building 3rd Floor Cleanroom
The Piranha chemical bench has one process tank prepared with sulfuric acid and hydrogen peroxide. The bench is equipped with two wafer holders and one holder for wafer pieces, one quick dump rinse tank (QDR), a hotplate and sink. The process tank has level sensor, temperature control and timer.
This is an accordion element with a series of buttons that open and close related content panels.
Configuration
Material Limitations
Contact:
Instrument Center: NFC
Instrument Location: Engineering Centers Building 3rd Floor Cleanroom
Process Description:
During wafer fabrication it is necessary to perform cleaning sequences. Wafer cleaning removes organics, particulates, surface oxide, surface ions, and metal contaminants. Cleaning can be a multi-step process involving acids and bases. A Piranha clean is one widely used process. A Piranha clean is comprised of hot sulfuric acid and hydrogen peroxide and is effective in removing organic contaminants.
Equipment Description:
The Piranha chemical bench has one process tank prepared with sulfuric acid and hydrogen peroxide. The bench is equipped with two wafer holders and one holder for wafer pieces, one quick dump rinse tank (QDR), a hotplate and sink. The process tank has level sensor, temperature control and timer.
Approved Materials for use in this equipment:
Check the APPROVED MATERIALS for this equipment on http://mywebscape.wisc.edu under WCAM in the group directories.
Date last modified: 1/16/2017
Date created: 3/27/2009
Content by: Rebecca Bauer