Thin Film Measurement System Filmetrics F20

FOM Name:  Reflectometer
Model:  Filmetrics F20
Contact: Anna Kiyanova (, 608-263-1735)
Center:  SMCL
Location: B47 Engineering Hall

Filmetrics F20 is used to measure the thickness and optical constants (index of refraction and coefficient of extinction) of transparent and semi-transparent thin films. Measured films must be optically smooth. Commonly measured films include semiconductor process films such as oxides, nitrides, resists, and polysilicon, optical coatings such as hardness and anti-reflection coatings, and other industrial coatings such as polyimides and diamond-like carbon. Films that can not be measured include very rough films and opaque films.


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  • Thickness measurement range: 15 nm – 50,000 nm (typical values)
  • Optical constant measurement range: 100 nm – 4000 nm
  • Spot size: 0.5 mm
  • Thickness accuracy: ±1 nm (at 500 nm thick silicon oxide on Si)
  • Precision and repeatability: up to 0.1 nm
  • Sample stages available: SS-1 (reflection, 0-2 mm thick samples) and LA1-RKM (reflection, thick samples)