NFC Atomic Layer Deposition tool

FOM name: CLAS Fiji ALD
Model: Fiji G2 ALD
Contact: Frank Flack, 608-265-3148
Center: NFC
Location: Engineering Centers Building 3rd Floor cleanroom

Deposition is an additive process.

The Fiji tool creates thin films via atomic layer deposition, which is a type of chemical vapor deposition.

Due to safety and contamination considerations, materials allowed in this tool are restricted. See the list of allowed materials in FOM.

This is an accordion element with a series of buttons that open and close related content panels.


  • ALD system with 6 precursor lines.
  • 200mm chuck capable of heating to 300 deg. C
  • Plasma generator for N2, O2 and H2
  • Ozone generator.
  • ALD Booster System
  • LVPD system
  • Materials available:
Aluminum Trimethylaluminum TMA (CH3)3Al
Titanium Tetrakis(dimethylamido)titanium(IV) TDMAT [(CH3)2N]4Ti
Niobium Tris(diethylamido)(tert-butylimido)niobium(V) TBTDEN ((CH3)6N)3NbN(CH3)
Hafnium Tetrakis(dimethylamido)hafnium(IV) TDMAH [(CH3)2N]4Hf
Silicon Bis(diethylamido)silane BDEAS SiH2[N(CH2CH3)2]2



  • The system is for depositing non-toxic materials.
  • Maximum film dep thickness is 40nm.
  • This instrument has material restrictions.  Consult the allowed materials list for this instrument in FOM.