Develop Wet Bench for Electron Beam Lithography

FOM Name:  CLAS E-beam Develop Wet Bench
Contact: Frank Flack, 608-265-3148
Center:  NFC
Location: Engineering Centers Building 3rd Floor Cleanroom

Process Description:

This bench supports primarily subtractive processes related to pattern formation. It is intended for use in developing lithography samples exposed on the Elionix e-beam tool.

Equipment Description:

The bench includes facilities for temperature-controlled development, as well as solvent vapor exhaust, DI water, and solvent waste disposal.

Due to safety and contamination considerations, materials allowed in this tool are restricted. See the list of allowed materials in FOM.