XRR is used for the characterization of mulilayer samples. It can measure film thickness and density of multilayer samples.
How it works — an X-ray beam is reflected off of a sample at very small diffraction angles generating a reflectivity pattern. A simulation of the reflectivity pattern gives an accurate measurement of thickness, interface roughness, and layer density for either crystalline or amorphous thin films.
This is an accordion element with a series of buttons that open and close related content panels.
Instrumentation Available
Key Attributes
- Signal Detected: Reflected X-rays
- Detection Limits: 1.5-10nm minimum layer thickness
- Thickness Resolution: ~1% of measured thickness
- Imaging available
- Probe Size: ~1cm
Strengths
- Analysis of large areas (>300 mm)
- Can analyze both conductive and insulating
- No prior knowledge of the optical properties of the film is required
- Minimal or no sample preparation required
- No vacuum required
Limitations
- Knowledge of the basic layer structure is required for the simulation
- Maximum film thickness ~300nm
Applications
- Measurement of film thickness and density on multilayer samples
- Measurement of interface roughness
- Thickness uniformity measurements
Additional Reading
