The Wisconsin Centers for Nanoscale Technology installed a new Veeco Fiji G2 Atomic Layer deposition System. Funding was provided by the Physics Department, Physics Professors Brar, Eriksson and McDermott, L&S and COE. The system is currently installed in the Nanoscale Fabrication Center and ready for use.
- ALD system with 6 precursor lines.
- 200mm chuck capable of heating to 300 deg. C
- Plasma generator for N2, O2 and H2
- Ozone generator.
- ALD Booster System
- LVPD system