Research work involving micro- and nanofabrication cannot proceed in a meaningful fashion without frequent checks to determine if the structures being created are forming as planned. Every step of the fabrication process can and should be quantified, and the measurements recorded for future reference. This is especially important in research work, which usually involves small numbers of samples, with changes in process or requirements between batches.
Electrical
This is an accordion element with a series of buttons that open and close related content panels.
What it is used to do
In many cases, it is important to characterize the electrical or electronic characteristics of either the bulk material used in nanofabrication, or the devices formed by nanofabrcation processes.
Probe technologies can measure such characteristics as sheet resistance of substrates, and device responses including I/V relations, capacitance, frequency response, etc.
How it works
Many electrical measurement techniques involve bringing small probe tips into contact with the surface of the sample, in order to localize the region being measured. The probes are connected to equipment such as function generators, measurement electronics, and recording devices.
Instrumentation Available
Additional Reading
Microscopy
This is an accordion element with a series of buttons that open and close related content panels.
What it is used to do
How it works
Instrumentation Available
Key Attributes
Strengths
Limitations
Applications
Additional Reading
Optical
This is an accordion element with a series of buttons that open and close related content panels.
What it is used to do
How it works
Instrumentation Available
- Filmetrics F20 Reflectometer
- Tencor FLX-2320 Thin Film Stress Measurement
- Rudolph Ellipsometer
Key Attributes
Strengths
Limitations
Applications
Additional Reading
Physical
This is an accordion element with a series of buttons that open and close related content panels.
What it is used to do
These are methods used to support the patterning process. This includes resist spinners to put down the photoresist, solvent benches to remove exposed resist, develop benches for developing the exposed resist, and a wet bench for cleaning the photomasks.
How it works
Instrumentation Available
Key Attributes
Strengths
Limitations
Applications
Additional Reading
